Reasons for unevenness caused by magnetron sputtering coating equipment

The causes of unevenness in magnetron sputtering vacuum coating machine coating are mainly vacuum, magnetic field and argon. At present, in the wide application of vacuum coating machines, no matter which kind of equipment is coated, there will be problems of film uniformity. Now we will look at the magnetron sputtering vacuum coating equipment to see what factors are causing unevenness.
Magnetron sputtering is in the orthogonal electromagnetic field. The closed magnetic field binds the electrons to make a spiral motion around the target surface. During the movement, the working gas argon gas ionizes a large amount of argon ions, and the argon ions accelerate the bombardment under the action of the electric field. The target is sputtered with a neutral target atom (or molecule) deposited on the substrate to form a film.
There are three main factors in the non-uniformity of the magnetron sputtering vacuum coating machine: vacuum state, magnetic field and argon:
1. The vacuum state needs to be controlled by the pumping system. Each pumping port must be started at the same time and the force is the same. This can control the uniformity of pumping. If the pumping is not uniform, the pressure in the vacuum chamber will not be uniform. The pressure has a certain influence on the movement of ions. In addition, the pumping time should be controlled. Too short will cause insufficient vacuum, but it will be too long and waste resources. However, if there is a vacuum gauge, it is not a problem to control it.
2. The magnetic field is operated orthogonally, but it is impossible to make the magnetic field strength 100% uniform. Generally, where the magnetic field is strong, the film thickness is large, and on the contrary, it is small, so the film thickness is caused. Inconsistent, but in the production process, the unevenness of the film due to the non-uniform magnetic field is not common, why? Although the magnetic field strength is not well controlled, but the workpiece is also running at the same time, and the target atom is deposited multiple times to complete the coating process. Although some parts are thick and some parts are thin for a while, another time is Inside, the strong magnetic field is deposited thicker in the original thin part, and deposited thin in the thick part, so many times, after the final film formation, the uniformity is quite good.

3, the uniformity of argon gas supply will also affect the uniformity of the film layer. The principle is similar to the vacuum degree. Due to the entry of argon gas, the pressure inside the vacuum chamber will change. The uniform pressure can control the uniformity of the film thickness. Sex.

Although some factors are insurmountable, as long as the preventive maintenance is done on time, strictly operated, strictly checked, and verified strictly, the qualification rate of the film layer is very high.

Coating technology exchange QQ group article from Dongguan Aijia Vacuum Technology Co., Ltd. http://


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